Second Hyper-NA EUVL Infrastructure Readiness Workshop

Sunday 21 Sept 2025, 08:00 → 17:15 US/Pacific

Grace Dodge Auditorium (Asilomar Conference Grounds)

Bruno La Fontaine

Registration is now open! Register HERE

Please join us for the Second Workshop on Hyper-NA EUV Lithography.

This workshop aims to initiate a broad dialog across the industry and major research institutions on the challenges and opportunities related to hyper-NA EUV lithography.

Through a few presentations from experts in the fields of exposure tools, optics, imaging, materials and metrology, we want to stimulate discussions and debates on this topic.

The goals of the Workshop would be to identify and prioritize the most important and/or urgent challenges to address and how we might tackle the overall task.

We are looking forward to seeing you in Monterey, California.

This meeting will be hosted by the Center of X-Ray Optics (CXRO) at the Grace Dodge Auditorium in the Asilomar Conference Grounds ( 800 Asilomar Ave, Pacific Grove, CA 93950)

Invitation and In-Person participation is required to attend this workshop. Please reach out to CXRO Director, Bruno La Fontaine for further inquiries.

If you have any questions, please contact 

Bruno La Fontaine (CXRO Director)
[email protected]
+1-408-505-6545

Lady Bonifacio (Event Coordinator)
[email protected]
+1-510-691-4998

1 Welcome

Speaker: Bruno La Fontaine (LBL-CXRO))

2 Introduction

3 Chipmaker perspective

Speaker: Florian Gstrein (Intel)

10:35 Break

4 Tool & Imaging

Speaker: Mark van de Kerkhof (ASML)

5 Metrology & Inspection

Speaker: Hiroki Miayi (Lasertec)

12:25 Lunch

6 Patterning materials (resists)

Speaker: Amrit Narasimhan (Inpria)

7 Process / pattern transfer

Speaker: Danilo De Simone (IMEC)

15:10 Break

8 Time for discussion & review instant polling results

9 Summarize agreements / common understanding

10 Closing remarks